US Patent Issued to Applied Materials on Jan. 20 for "Sputter system with magnet motion source" (American, Indian Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,133, issued on Jan. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Sputter system with magnet motion source" was invented by Nagabhushana Nanjundappa (Bangalore, India), Kirankumar Neelasandra Savandaiah (Bangalore, India), Bhaskar Prasad (Jamshedpur, India), Bryan Jeffrey Puch (Kalispell, Mont.), Martin Lee Riker (Milpitas, Calif.) and Keith A. Miller (Mountain View, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sputter source assembly for a sputter system is disclosed. The sputter source assembly includes a magnetron movable within a reservoir. The sputter source assembly also includes a magnetron actuator having firs...