US Patent Issued to Applied Materials on Jan. 20 for "Process chamber qualification for maintenance process endpoint detection" (American, Indian Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,530,022, issued on Jan. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Process chamber qualification for maintenance process endpoint detection" was invented by Arvind Shankar Raman (Austin, Texas), Harikrishnan Rajagopal (Santa Clara, Calif.), Minal Balkrishna Shettigar (San Jose, Calif.), Vishwath Ram Amarnath (Chenna, India) and Yi Qi (Niskayuna, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for process chamber qualification for maintenance process endpoint detection are provided. Data collected by one or more sensors of a process chamber of a manufacturing system is identified. The identified data is col...