US Patent Issued to Applied Materials on Feb. 3 for "Chlorine-free removal of molybdenum oxides from substrates" (California Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,523, issued on Feb. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chlorine-free removal of molybdenum oxides from substrates" was invented by Jiajie Cen (San Jose, Calif.), Feng Q. Liu (San Jose, Calif.), Zheng Ju (Sunnyvale, Calif.), Zhiyuan Wu (San Jose, Calif.), Kevin Kashefi (San Ramon, Calif.), Mark Saly (Santa Clara, Calif.) and Xianmin Tang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of removing molybdenum oxide from a surface of a substrate comprise exposing the substrate having a molybdenum oxide layer on the substrate to a halide etchant having the formula RmSiX4-m, wherein m is an integer fr...