US Patent Issued to Applied Materials on Feb. 3 for "Batch processing chambers for plasma-enhanced deposition" (California Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,542,256, issued on Feb. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Batch processing chambers for plasma-enhanced deposition" was invented by Jianming Fu (Palo Alto, Calif.), Tza-Jing Gung (San Jose, Calif.), Sanjeev Baluja (Campbell, Calif.), Haitao Wang (Santa Clara, Calif.), Mandyam Sriram (San Jose, Calif.), Srinivas Gandikota (Santa Clara, Calif.) and Steven V. Sansoni (Livermore, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure are directed to PEALD batch processing chambers. Some embodiments are directed to processing chambers having one or more inductively coupled plasma (ICP) coils electri...