ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,564,021, issued on Feb. 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Method of processing a substrate" was invented by Rajaram Narayanan (Santa Clara, Calif.), Fang Ruan (Milpitas, Calif.), Prashant Kumar Kulshreshtha (San Jose, Calif.), Diwakar N. Kedlaya (San Jose, Calif.) and Karthik Janakiraman (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to a method of processing a substrate. The method includes exposing the substrate positioned in a processing volume of a processing chamber to a hydrocarbon-containing gas mixture, exposing the substrate to a boron-cont...