US Patent Issued to Applied Materials on Feb. 24 for "Carbon hardmask opening using boron nitride mask" (California Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,564,022, issued on Feb. 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Carbon hardmask opening using boron nitride mask" was invented by Jeong Hwan Kim (San Jose, Calif.), Yeonju Kwak (Sunnyvale, Calif.), Qian Fu (Pleasanton, Calif.), Siyu Zhu (San Jose, Calif.), Chuanxi Yang (Los Altos, Calif.) and Hang Yu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing methods may include providing an oxygen-containing precursor to a processing region of a semiconductor processing chamber. The methods may include forming a plasma of the oxygen-containing precursor to produce oxygen-containing plas...