US Patent Issued to Applied Materials on Feb. 10 for "Selective etching of silicon-containing material relative to metal-doped boron films" (California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,651, issued on Feb. 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Selective etching of silicon-containing material relative to metal-doped boron films" was invented by Han Wang (Sunnyvale, Calif.), Yu Yang (Sunnyvale, Calif.), Jing Zhang (Santa Clara, Calif.), Aykut Aydin (Sunnyvale, Calif.), Guoqing Li (Santa Clara, Calif.), Guangyan Zhong (Sunnyvale, Calif.), Rui Cheng (San Jose, Calif.), Gene H. Lee (San Jose, Calif.), Srinivas Guggilla (San Jose, Calif.), Sinae Heo (Santa Clara, Calif.), Eswaranand Venkatasubramanian (Santa Clara, Calif.), Abhijit Basu Mallick (Sunnyvale, Calif.) and Karthik Janakiraman (San Jose, Calif.).

According to the abstract* relea...