ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,003, issued on Feb. 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Atomic layer deposition part coating chamber" was invented by Sriharsha Dharmapura Sathyanarayanamurthy (Bengaluru, India), Hanish Kumar Panavalappil Kumarankutty (Bangalore, India), Kirubanandan Naina Shanmugam (Bangalore, India), Manojkumar Shanmugasundaram (Bangalore, India), Sriharish Srinivasan (Bangalore, India) and Vinay Konana Basavaraj (Bangalore, India).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of part coating reactors are provided herein. In some embodiments, a part coating reactor includes a lid assembly, comprising: a body that include...