US Patent Issued to Applied Materials on Dec. 2 for "Systems and methods for deposition residue control" (California Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,981, issued on Dec. 2, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Systems and methods for deposition residue control" was invented by Abdul Aziz Khaja (San Jose, Calif.) and Anjana M. Patel (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing systems may include a chamber body comprising sidewalls and a base. The systems may include a substrate support extending through the base of the chamber body. The substrate support may include a support platen and a stem. The systems may include a baffle extending about a stem of the substrate support. The baffle may define one or more apertures...