US Patent Issued to APPLIED MATERIALS on Dec. 2 for "Atomic layer deposition coating system for inner walls of gas lines" (Indian, American Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,571, issued on Dec. 2, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Atomic layer deposition coating system for inner walls of gas lines" was invented by Hanish Kumar Panavalappil Kumarankutty (Bangalore, India), Yogesh Tomar (Bangalore, India), Nikshep M. Patil (Bangalore, India), Hari Venkatesh Rajendran (Bangalore, India), Kirubanandan Naina Shanmugam (Bangalore, India), Gayatri Natu (Mumbai, India), Mahesh Arcot (Mumbai, India), Senthil Kumar Nattamai Subramanian (Hosur, India), Steven D. Marcus (San Jose, Calif.) and Michael R. Rice (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of an apparatus fo...