US Patent Issued to Applied Materials on Dec. 16 for "Halogen resistant coatings and methods of making and using thereof" (Indian, American Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,692, issued on Dec. 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Halogen resistant coatings and methods of making and using thereof" was invented by Prerna Goradia (Mumbai, India), Jennifer Y. Sun (Santa Clara, Calif.), Xiaowei Wu (Santa Clara, Calif.), Geetika Bajaj (Mumbai, India), Atul Chaudhari (Mumbai, India) and Ankur Kadam (Mumbai, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous s...