US Patent Issued to Applied Materials on Aug. 4 for "Purge ring for reduced substrate backside deposition" (California Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,561, issued on Aug. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Purge ring for reduced substrate backside deposition" was invented by Geraldine Vasquez (San Jose, Calif.), Yi Xu (San Jose, Calif.), Dien-yeh Wu (San Jose, Calif.), Aixi Zhang (Sunnyvale, Calif.), Jallepally Ravi (San Ramon, Calif.) and Yu Lei (Belmont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of a purge ring for use in a process chamber are provided herein. In some embodiments, a purge ring includes: an annular body having an inner portion and an outer portion, wherein the inner portion includes an inner surface of the annular body, the in...