US Patent Issued to Applied Materials on Aug. 4 for "Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods" (California Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,570, issued on Aug. 4, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods" was invented by Shawn Thanhson Le (San Jose, Calif.), Amir H. Tavakoli (San Jose, Calif.), Ala Moradian (Sunnyvale, Calif.) and Tetsuya Ishikawa (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein generally relate to highly reflective metallic alloys for components (such as chamber components) of semiconductor processing equipment, and related methods and processing chambers. In one or more embodiments, a processing c...