US Patent Issued to Applied Materials on Aug. 25 for "Semiconductor cleaning using plasma-free precursors" (Indian, Singaporean, American Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,080, issued on Aug. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor cleaning using plasma-free precursors" was invented by Abhishek Mandal (Thane, India), Nitin Deepak (Thane, India), Geetika Bajaj (Mumbai, India), Ankur Kadam (Thane, India), Gopi Chandran Ramachandran (Mumbai, India), Suraj Rengarajan (Bangalore, India), Farhad K. Moghadam (Saratoga, Calif.), Deenesh Padhi (Sunnyvale, Calif.), Srinivas M. Satya (Cupertino, Calif.), Manish Hemkar (Singapore), Vijay Tripathi (Mumbai, India) and Darshan Thakare (Palghar, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing methods may...