US Patent Issued to Applied Materials on Aug. 18 for "Photoresist loading solutions for flat optics fabrication" (California Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,710,573, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Photoresist loading solutions for flat optics fabrication" was invented by Sage Toko Garrett Doshay (Saratoga, Calif.), Rutger Meyer Timmerman Thijssen (Sunnyvale, Calif.), Ludovic Godet (Sunnyvale, Calif.), Chien-An Chen (San Jose, Calif.) and Pinkesh Rohit Shah (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to methods for fabricating optical devices. One embodiment of the method includes disposing a structure material layer on a surface of a substrate and disposing a patterned photoresist over the st...