ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,853, issued on Aug. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Oxide quality differentiation" was invented by Lala Zhu (Fremont, Calif.), Yimin Huang (Santa Clara, Calif.), Shi Che (Sunnyvale, Calif.), Yi Jin (San Mateo, Calif.), Dongqing Yang (Pleasanton, Calif.), Lakmal C. Kalutarage (San Jose, Calif.), Anchuan Wang (San Jose, Calif.) and Nitin K. Ingle (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary methods and systems of semiconductor processing may include etching a portion of a silicon-containing material from a substrate disposed within a processing region of a semiconductor processing chambe...