US Patent Issued to Applied Materials on Aug. 11 for "Radio-frequency (RF) matching network and tuning technique" (California, Washington Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,277, issued on Aug. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Radio-frequency (RF) matching network and tuning technique" was invented by Yue Guo (Redwood City, Calif.), Kartik Ramaswamy (San Jose, Calif.), A N M Wasekul Azad (Santa Clara, Calif.), Nicolas J. Bright (Arlington, Wash.) and Yang Yang (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, plasma processing systems and methods for tuning in a radio frequency (RF) plasma processing system for improving substrate processing metrics. Some embodiments are directed to a method for processing a substrate in a...