US Patent Issued to Applied Materials on April 7 for "Rotary reactor for deposition of films onto particles" (Indian, American Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,577, issued on April 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Rotary reactor for deposition of films onto particles" was invented by Brian Hayes Burrows (San Jose, Calif.), Sekar Krishnasamy (Bangalore, India), Ayyanagouda Raravi (Bangalore, India), Monika Mudalkar (Karnataka, India), Govindraj Desai (Karnataka, India), Hemantha Kumar Raju (Bangalore, India), Basavaraj Pattanshetty (Bangalore, India), David Masayuki Ishikawa (Mountain View, Calif.), Visweswaren Sivaramakrishnan (Cupertino, Calif.), Shrikant Swaminathan (Santa Clara, Calif.), Mario Cambron (San Jose, Calif.), Robert Navasca (Union City, Calif.), Miaojun Wang (Santa Clara, Calif.) and Jonath...