US Patent Issued to Applied Materials on April 21 for "Substrate stress management using variable energy and variable dose implantation" (Massachusetts, California Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,280, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Substrate stress management using variable energy and variable dose implantation" was invented by Stanislav S. Todorov (Topsfield, Mass.), D. Jeffrey Lischer (Acton, Mass.), Wonjae Lee (Fremont, Calif.) and Pradeep Subrahmanyan (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of stress management in a substrate. The method may include comprising providing a stress compensation layer on a main surface of the substrate; and performing a dynamic implant procedure in an ion implanter to implant a set of ions into the stress compensation lay...