US Patent Issued to Applied Materials on April 21 for "Protection treatments for surfaces of semiconductor fabrication equipment" (Indian, American Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,286, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Protection treatments for surfaces of semiconductor fabrication equipment" was invented by Katherine Woo (Santa Clara, Calif.), Jennifer Y. Sun (Fremont, Calif.), Jian Li (Fremont, Calif.), Wenhao Zhang (San Jose, Calif.), Mayur Govind Kulkarni (Bangalore, India), Chidambara A. Ramalingam (Fremont, Calif.), Ryan Sheil (Santa Cruz, Calif.), Martin J. Seamons (San Jose, Calif.) and Nitin Deepak (Thane, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor fabrication component preparation methods are described. In embodiments, the methods include form...