US Patent Issued to APPLIED MATERIALS on April 21 for "Method and apparatus with high conductance components for chamber cleaning" (California Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,907, issued on April 21, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Method and apparatus with high conductance components for chamber cleaning" was invented by Rick Kustra (San Jose, Calif.), Kaushik Comandoor Alayavalli (Sunnyvale, Calif.), Jay D. Pinson II (San Jose, Calif.), Sathya Swaroop Ganta (Sunnyvale, Calif.) and Anup Kumar Singh (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate a process chamber including a lid and a chamber body coupled to the lid. The chamber body and lid define a process volume and a coupling ring is disposed within the chamber...