US Patent Issued to Applied Materials on April 14 for "Water-based, high-efficiency chemical reagent for substrate surface particle removal" (Singaporean, American Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,599,937, issued on April 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Water-based, high-efficiency chemical reagent for substrate surface particle removal" was invented by Hong Yan (Singapore), Raymond Hoiman Hung (Palo Alto, Calif.), Ying Wang (Singapore) and Xundong Dai (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure provided herein include systems and methods for cleaning semiconductor substrates The method includes rotating a substrate disposed on a substrate support, spraying a front side of the substrate using a cleaning agent including one or more chelating agents through a front side...