US Patent Issued to Applied Materials on April 14 for "Systems and methods for selective metal-containing hardmask removal" (California Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,690, issued on April 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Systems and methods for selective metal-containing hardmask removal" was invented by Baiwei Wang (Santa Clara, Calif.), Rohan Puligoru Reddy (San Jose, Calif.), Xiaolin C. Chen (San Ramon, Calif.), Wanxing Xu (Sunnyvale, Calif.), Zhenjiang Cui (San Jose, Calif.) and Anchuan Wang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing methods may include flowing an etchant precursor into a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region. The substrate may d...