US Patent Issued to Applied Materials Israel on Nov. 3 for "Unsupervised method to increase signal-to-noise-ratio of defects in an inspection system" (Israeli Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,179, issued on Nov. 3, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Unsupervised method to increase signal-to-noise-ratio of defects in an inspection system" was invented by Yuval Alfassi (Rehovot, Israel), Boris Sherman (Rehovot, Israel), Marcelo Bacher (Givatayim, Israel) and Ortal Yesodi (Modiin-Maccabim-Reut, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for increasing Signal-to-Noise-Ratio (SNR) of defect detection in inspection of wafers or masks, the method including receiving a current image, receiving a reference image, receiving an indication for existence of a defect in the current image, producing a d...