US Patent Issued to Applied Materials Israel on Nov. 3 for "Registration between an inspection image and a design image" (Israeli, Indian Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,176, issued on Nov. 3, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Registration between an inspection image and a design image" was invented by Ganesh Kumar Mohanur Raghunathan (Bengaluru, India), Ubhay Kumar (Bengaluru, India), Shani Gat (Tel Aviv, Israel), Tal Frank (Tel Aviv, Israel), Balaji Chithugnanamoorthy (Bangalore, India) and Rafael Bistritzer (Petach-Tikva, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided systems and methods comprising obtaining an inspection image of a semiconductor specimen, and a design image, wherein the design image is informative of design elements, determining data Dpitc...