US Patent Issued to Applied Materials Israel on May 12 for "Coreset based mask inspection for semiconductor specimen fabrication" (Israeli, American Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,626,356, issued on May 12, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Coreset based mask inspection for semiconductor specimen fabrication" was invented by Evgeny Bal (Natanya, Israel), Ariel Shkalim (DN Sede Gat, Israel), Vladimir Ovechkin (Ashdod, Israel) and Simion Kurin (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method of a method of mask inspection, comprising: obtaining a plurality of aerial images of a mask; generating a plurality of image coresets corresponding to the aerial images, comprising, for each given aerial image: applying a printing threshold on the given aerial ...