US Patent Issued to Applied Materials Israel on Jan. 20 for "Matching based defect examination for semiconductor specimens" (Israeli Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,530,764, issued on Jan. 20, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Matching based defect examination for semiconductor specimens" was invented by Yuval Alfassi (Rehovot, Israel), Boris Sherman (Rehovot, Israel), Marcelo Bacher (Givatayim, Israel) and Ortal Yesodi (Modiin-Maccabim-Reut, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method of defect detection on a semiconductor specimen based on template matching or machine learning (ML). Template matching is performed between a set of template patches and a set of runtime images, by selectively performing at least two of the following: mat...