US Patent Issued to Applied Materials, National University of Singapore on Nov. 18 for "Molybdenum (0) precursors for deposition of molybdenum films" (Singaporean, American Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,316, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Molybdenum (0) precursors for deposition of molybdenum films" was invented by Andrea Leoncini (Singapore), Paul Mehlmann (Singapore), Nemanja Dordevic (Singapore), Han Vinh Huynh (Singapore), Doreen Wei Ying Yong (Singapore), Mark Saly (Santa Clara, Calif.) and Bhaskar Jyoti Bhuyan (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Molybdenum(0) coordination complexes comprising ligands which each coordinate to the metal center by nitrogen or phosphorous are described. Methods for depositing molybdenum...