US Patent Issued to Applied Materials, National University of Singapore on Feb. 10 for "Oxidants and strained-ring precursors" (Singaporean, American Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,643, issued on Feb. 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Oxidants and strained-ring precursors" was invented by Chandan Kr Barik (Singapore), Doreen Wei Ying Yong (Singapore), John Sudijono (Singapore), Cong Trinh (Santa Clara, Calif.), Bhaskar Jyoti Bhuyan (San Jose, Calif.), Michael Haverty (Mountain View, Calif.), Muthukumar Kaliappan (Fremont, Calif.), Yingqian Chen (Singapore), Anil Kumar Tummanapelli (Singapore) and Richard Ming Wah Wong (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Novel cyclic silicon precursors and oxidants are described. Methods for ...