US Patent Issued to APPLIED MATERALS on Sept. 22 for "Implant hard mask for substrates" (Chinese, American Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,610, issued on Sept. 22, was assigned to APPLIED MATERALS INC..

"Implant hard mask for substrates" was invented by Jun Fang (Xi'an, China), Ludovico Megalini (Santa Clara, Calif.), Yi Zheng (Sunnyvale, Calif.), Jang Seok Oh (Santa Clara, Calif.) and Feng Shou Wang (Xi'an city, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming an implant hard mask on a substrate provides a multi-layer hardmask resistant to high processing temperatures and ion energies. In some embodiments, the method may comprise depositing a screen layer of oxide material with a thickness of approximately 20 nm to approximately 100 nm, depositing a first lay...