ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,690, issued on Oct. 27, was assigned to Amazon Technologies Inc. (Seattle).

"System for suitability assessment of biometric input" was invented by Alon Shoshan (Haifa, Israel), Oron Anschel (Bethlehem of Galilee, Israel), Rui Zhao (Bellevue, Wash.), Carlos D. Castillo (Seattle), Igor Kviatkovsky (Haifa, Israel), Manoj Aggarwal (Seattle) and Gerard Guy Medioni (Los Angeles).

According to the abstract* released by the U.S. Patent & Trademark Office: "A biometric identification system uses images acquired using different modalities. A suitability prediction module (SPM) is a machine learning model trained to accept an input image and provide a predicted distance value (PDV) as outpu...