US Patent Issued to Align Technology on April 7 for "Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom" (Austrian, American Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,147, issued on April 7, was assigned to Align Technology Inc. (San Jose, Calif.).

"Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom" was invented by Robert Liska (Schleinbach, Austria), Christian Gorsche (Vienna), Gyorgy Harakaly (Vienna), Markus Kury (Vienna), Jurgen Stampfl (Vienna), Peter Dorfinger (Los Altos Hills, Calif.), Yan Chen (Cupertino, Calif.), Chunhua Li (Cupertino, Calif.) and Srinivas Kaza (Mountain View, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein are curable compositions for use in a high temperature litho...