US Patent Issued to AIXTRON on Sept. 1 for "Method and device for depositing a layer containing a group five element in a process chamber and subsequent cleaning of the process chamber" (German Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,309, issued on Sept. 1, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Method and device for depositing a layer containing a group five element in a process chamber and subsequent cleaning of the process chamber" was invented by Ilio Miccoli (Herzogenrath, Germany), Hassan Larhrib (Herzogenrath, Germany) and Peer Mukinovic (Baesweiler, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for depositing layers containing a group five element on a substrate, in which process gas is fed into a process chamber. After depositing the layer, the process chamber is cleaned as follows. The process chamber is heated to a first cleaning temper...