US Patent Issued to AIXTRON on Oct. 6 for "Gas inlet element of a CVD reactor with two infeed points" (Belgian Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,753,505, issued on Oct. 6, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Gas inlet element of a CVD reactor with two infeed points" was invented by Adam Boyd (Kelmis, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a device and a method for depositing at least one layer on at least one substrate, a first gas flow comprising a reactive gas is fed through a first gas inlet opening, and a second gas flow is fed through a second gas inlet opening, into at least one gas distribution volume of a gas inlet element. The inlet element has a gas outlet surface with a multiplicity of gas outlet openings which are fluidically connected to the gas di...