US Patent Issued to AIXTRON on July 7 for "Method for ascertaining the end of a cleaning process for a process chamber of a MOCVD reactor" (German, Belgian Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,674,234, issued on July 7, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Method for ascertaining the end of a cleaning process for a process chamber of a MOCVD reactor" was invented by Utz Herwig Hahn (Raeren, Belgium), Martin Eickelkamp (Wurselen, Germany) and Dirk Fahle (Monchengladbach, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a cleaning process for removing parasitic depositions on surfaces of a process chamber of a CVD reactor, a susceptor of the CVD reactor is heated by a heating device, and the susceptor is regulated to a specified temperature or is heated with a constant heat output. Concurrently, an etching gas is supplie...