ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,166, issued on July 14, was assigned to AIXTRON SE (Herzogenrath, Germany).
"Gas inlet device for a CVD reactor" was invented by Martin Eickelkamp (Wurselen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas distribution device has a plurality of gas inlet regions that are arranged above each other and can be adjusted by switching on or off respective valves. The gas inlet regions can also be adjusted by switching over one or more feed conduits through which process gases can be fed into respective gas distribution volumes of gas outlet zones. The respective gas distribution volumes are arranged above each other at several levels. Only on...