US Patent Issued to AGC SI-TECH on June 23 for "Hydrophobic silica particles, use of same, and method for producing hydrophobic silica particles" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,385, issued on June 23, was assigned to AGC SI-TECH Co. LTD. (Kitakyushu, Japan).

"Hydrophobic silica particles, use of same, and method for producing hydrophobic silica particles" was invented by Shinnosuke Arimitsu (Fukuoka, Japan) and Naoyuki Izumi (Fukuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to hydrophobic silica particles including silica particles each being impregnated with a higher alcohol having 19 or more carbon atoms, and having a binding degree of the higher alcohol to the silica particles of 70% or more measured by the following measuring method: the measuring method: 1 g of the hydrophobi...