US Patent Issued to AGC on Sept. 29 for "Tellurium-containing compound, polymer, and method for producing polymer" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,306, issued on Sept. 29, was assigned to AGC Inc. (Tokyo).

"Tellurium-containing compound, polymer, and method for producing polymer" was invented by Shun Watanuki (Chiyoda-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are: a tellurium-containing compound represented by Formula (M1); a polymer of a tellurium-containing compound represented by any one of Formulae (M1) to (M3); and a method for producing a polymer. Each of X1 to X3, Y1 to Y3 and Z1 to Z3 independently denotes a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; at least one of X1, ...