US Patent Issued to ADVANCED MICRO FOUNDRY on June 30 for "Method and system for measurement of optical loss in wafer level testing via wavelength-route division" (Singaporean Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,405, issued on June 30, was assigned to ADVANCED MICRO FOUNDRY PTE. LTD. (Singapore).

"Method and system for measurement of optical loss in wafer level testing via wavelength-route division" was invented by Shawn Yohanes Siew (Singapore), Bo Li (Singapore), Feng Gao (Singapore) and Xianshu Luo (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a system of measurement for optical loss that includes the light source unit that is further provided to the first fiber port assembly. The first fiber port assembly is connected with the first grating coupler unit. The first grating coupler unit is connected with the splitter unit. The spl...