ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,742,241, issued on Sept. 22, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).
"Heating apparatus, CVD equipment including the heating apparatus" was invented by Zhenyu Zheng (Shanghai), Zhennan Xie (Shanghai) and Yong Jiang (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a heating apparatus for heating a rotatable wafer susceptor so as to improve temperature uniformity of various zones of the top surface of the wafer susceptor. The wafer susceptor has a rotation axis; the heating apparatus is disposed beneath the wafer susceptor and vertically spaced a distance from the wafer susceptor. The heating appar...