US Patent Issued to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA on Nov. 3 for "Coating for performance enhancement of semiconductor apparatus" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,333, issued on Nov. 3, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (Shanghai).

"Coating for performance enhancement of semiconductor apparatus" was invented by Xiaoming He (Shanghai), Li Zhang (Shanghai), Xingjian Chen (Shanghai), Tuqiang Ni (Shanghai) and Zhaoyang Xu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing chamber having advanced coating for the showerhead and for an extended bottom electrode. The extended bottom electrode can be formed by one or more of the focus ring, cover ring, and plasma confinement ring. The extended electrode can be formed using a one-piece composite cover ring. The com...