US Patent Issued to Advanced Energy Industries on March 3 for "Plasma behaviors predicted by current measurements during asymmetric bias waveform application" (Colorado Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,572, issued on March 3, was assigned to Advanced Energy Industries Inc. (Denver).

"Plasma behaviors predicted by current measurements during asymmetric bias waveform application" was invented by Daniel Carter (Fort Collins, Colo.), Victor Brouk (Fort Collins, Colo.) and Denis Shaw (Fort Collins, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A bias supply configured for predicting behavior of one or more aspects of a plasma load by measuring a current waveform is disclosed. The bias supply applies an asymmetric periodic voltage waveform and a corresponding current waveform. The asymmetric periodic voltage waveform includes a first section comp...