ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,578, issued on Aug. 4, was assigned to Advanced Energy Industries Inc. (Denver).

"Plasma processing based on bias supply reporting" was invented by Denis Shaw (Fort Collins, Colo.) and Daniel Carter (Fort Collins, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A generator to provide a source waveform, and a controller configured to receive a signal indicative of power reflected to the generator, receive timing information from a bias supply, and provide a report of the impedance based upon the bias waveform information."

The patent was filed on Nov. 13, 2024, under Application No. 18/946,058.

*For further information, including images, charts...