US Patent Issued to Advanced Energy Industries on Aug. 4 for "Control of plasma sheath with bias supplies" (Colorado, California Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,700,569, issued on Aug. 4, was assigned to Advanced Energy Industries Inc. (Denver).

"Control of plasma sheath with bias supplies" was invented by Denis Shaw (Fort Collins, Colo.), Kevin Fairbairn (Los Gatos, Calif.) and Daniel Carter (Fort Collins, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a subst...