US Patent Issued to Advanced Echem Materials on Sept. 29 for "Resin composition and cured film" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,344, issued on Sept. 29, was assigned to Advanced Echem Materials Co. Ltd. (Taoyuan, Taiwan).

"Resin composition and cured film" was invented by Yi-Fang Hsieh (Taoyuan, Taiwan), Yu-Ning Chen (Taoyuan, Taiwan), Shao-Li Ho (Taoyuan, Taiwan) and Hui-Ju Chen (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resin composition and a cured film are provided. The resin composition includes a resin (A), a crosslinking agent (B), a surfactant (C), an additive (D) and a solvent (E). The resin (A) includes at least one of a phenol-based resin (A-1) and a polystyrene resin including a hydroxyl group (A-2). The additive (D) includes a fluoro-base...