US Patent Issued to Adtec Plasma Technology on July 7 for "Variable reactance circuit and impedance matching device provided with such circuit" (Japanese Inventor)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,584, issued on July 7, was assigned to Adtec Plasma Technology Co. Ltd. (Hiroshima, Japan).

"Variable reactance circuit and impedance matching device provided with such circuit" was invented by Etsuro Kawata (Hiroshima, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An impedance matching device comprises a variable reactance circuit. The variable reactance circuit comprises a loosely coupled line portion 4 which includes a first line 2 and a second line 3 loosely coupled to the first line. One end 3a of the second line is connected to ground 5. The variable reactance circuit further comprises a capacity variable portion 6 provided between the o...