US Patent Issued to Adobe on Nov. 4 for "Mask conditioned image transformation based on a text prompt" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,462,449, issued on Nov. 4, was assigned to Adobe Inc. (San Jose, Calif.).

"Mask conditioned image transformation based on a text prompt" was invented by Ambareesh Revanur (San Jose, Calif.), Debraj Debashish Basu (Sunnvyale, Calif.), Shradha Agrawal (Milpitas, Calif.), Dhwanit Agarwal (San Jose, Calif.) and Deepak Pai (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In accordance with the described techniques, an image transformation system receives an input image and a text prompt, and leverages a generator network to edit the input image based on the text prompt. The generator network includes a plurality of layers configured to perfor...