ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,777, issued on April 21, was assigned to ACM RESEARCH (SHANGHAI) INC. (Shanghai).
"Substrate processing apparatus" was invented by Hao Feng (Shanghai), Yuqi Wang (Shanghai), Rong Xu (Shanghai), Xiaoyan Zhang (Shanghai) and Hui Wang (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed in an embodiment of the present invention is a substrate processing apparatus, comprising a processing chamber, a liquid supply tank and a recovery tank. A first pipeline connects a first liquid inlet and a liquid outlet of the liquid supply tank. A second pipeline connects the first pipeline and a liquid inlet of the processing chamber. A third pipeline ...