US Patent Issued on Sept. 29 for "Ski mask" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. D1,149,294, issued on Sept. 29.

"Ski mask" was invented by Yang Bai (Guangzhou, China) and Heyang Cheng (Luohe, China).

The patent was filed on April 26, 2024, under Application No. D/939,412.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1149294&OS=D1149294&RS=D1149294

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