ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,039, issued on June 30.
"Method of manufacturing thin film devices" was invented by Furui Tan (Kaifeng Henan, China), Chen Dong (Kaifeng Henan, China), Wanlong Wang (Kaifeng Henan, China), Yuhao Song (Kaifeng Henan, China) and Mahshid Sam (Victoria, Canada).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of concomitantly manufacturing at least two thin-film devices is provided, the method comprising: applying a solution on a first surface of a first planar substrate; positioning a second surface of a second planar substrate proximate to the first surface of the first planar substrate to provide parallelly disposed adjacent substrates, such th...